半导体晶片研磨粉99含量平板状氧化铝粉等同于FUJIMI品质PWA15详细介绍

半导体晶片研磨粉99含量平板状氧化铝粉等同于FUJIMI品质PWA15

DESCRIPTION/产品介绍:

Platelet calcined alumina powder, also known as tabulated aluminum oxide grinding powder. It is named after its particle crystal structure being in the shape of scales/flat plates. The crystal form of flake alumina is α- Al2O3 has high hardness and grinding performance. In the electronics industry, polishing and polishing require high surface precision. In order to ensure precise grinding effects and yield, abrasive materials with sharp crystal shapes can no longer meet the requirements. The surface of the abrasive particles of flake/flat alumina is flat and smooth, and the diameter to thickness ratio of the particles can be adjusted by adjusting the synthesis method. Grinding semiconductor chips or other microelectronic components is less prone to scratches, greatly improving the yield of qualified chips. The production of platelet calcined alumina adopts a high-temperature calcined method to promote the lateral growth of crystals and form regular hexagonal powders with a tabulated structure. The suspension treated aluminum oxide grinding powder of platelet shape gets an uniform particle size distribution. That ensure a fine grinding surface.

片状氧化铝又称为平板状氧化铝，因其颗粒晶型为鳞片/平板形状而得名。片状氧化铝晶型为α-Al2O3，具有很高的硬度和研磨性能。在电子行业的打磨抛光对表面的精细度要求高，为***精细的研磨效果和成品率，晶体形状为尖角状的磨料已经不能满足要求。片状/平板状氧化铝的磨粒表面平整光滑，颗粒的径厚比可以通过调整合成方法进行调节。研磨半导体晶片或其他微电子元件时不易产生划伤，大大提高了晶片的合格品率。片状氧化铝的生产采用高温烧结的方法，促使晶体进行横向生长，并形成具有片状结构的规则六角型粉体。水洗分选工艺的片状氧化铝粒度集中度高，有利于研磨表面的一致性。

HXTA03电镜图:

HXTA15电镜图：

对于半导体材料如半导体硅片，平板状氧化铝的应用，可以减少磨削时间，大幅提高研磨效率，减少磨片机的损耗，节省人工和磨削成本，提高磨削合格率。品质接近国外品牌。

显像管玻壳磨削工效提高3-5倍；

合格品率提高10-15%，半导体硅片合格品率达到***以上；

研磨消耗量比普通氧化铝抛光粉减少40-40%；

半导体晶片研磨粉99含量平板状氧化铝粉等同于FUJIMI品质PWA15的特点：

1.     海旭磨料生产的片状氧化铝对标进口产品，可以达到进口片状氧化铝粉的研磨效果。

2.     晶型平整无棱角，研磨时磨粒于工件之间产生平面滑动效果，不易产生划痕。

3.     硬度高，磨削力强。片状氧化铝具有类似于刚玉的α-Al2O3晶相，适用与大多数材料的研磨和抛光。

4.     磁性物含量低，清洁度高，粒径一致性高。

5.     熔点高，机械强度高，磨削效***。

6.     颗粒大小可控，3-50微米均可获得。

7.     颗粒的平整性使片状氧化铝粉体易于分散，适合制成研磨剂或研磨液。

8.     耐腐蚀、化学稳定性强、抗氧化性能优越，不会于研磨液中的液体介质发生反应。

9.     比表面积大，表面活性和附着力由于电熔刚玉。

10.  片状氧化铝易于分散，粉体不易团聚在晶圆表面造成堆积，影响抛光平整度。

Characteristics of Platelet calcined alumina powder:

1. The Platelet calcined alumina powder produced by Haixu Abrasive can achieve the grinding effect of imported sheet-like aluminum oxide powder compared to imported products.

2. The crystal form is flat without edges and corners, and during grinding, the abrasive particles produce a flat sliding effect between the workpiece, making it less prone to scratches.

3. High hardness and strong grinding force. Flaky alumina has properties similar to corundum α- Al2O3 crystal phase, suitable for grinding and polishing of most materials.

4. Low magnetic content, high cleanliness, and high particle size consistency.

5. High melting point, high mechanical strength, and high grinding efficiency.

6. The particle size is controllable and can be obtained from 3 to 50 microns.

7. The flatness of the particles makes the flake alumina powder easy to disperse, making it suitable for making abrasives or grinding liquids.

8. It has corrosion resistance, strong chemical stability, and superior antioxidant performance, and will not react with liquid media in the grinding fluid.

9. Large specific surface area, surface activity and adhesion due to fused corundum.

10. Platelet calcined alumina powder is easy to disperse, and the powder is not easy to aggregate on the surface of the wafer, causing accumulation and affecting the polishing smoothness.

半导体晶片研磨粉99含量平板状氧化铝粉等同于FUJIMI品质PWA15化学成分：

半导体晶片研磨粉99含量平板状氧化铝粉等同于FUJIMI品质PWA15物理性能：

生产规格：

粒度检测报告：

产品应用范围：

    1）电子行业 ： 半导体单晶硅片、压电石英晶体、化合物半导体（砷化镓、磷化铟）的研磨抛光。
    2）玻璃行业 ： 水晶，石英玻璃，显象管玻壳屏，光学玻璃，液晶显示器（LCD）玻璃基板，压电石英晶体的研磨加工。
    3）涂附行业 ： 特种涂料和等离子喷涂的填充剂。
    4）金属和陶瓷加工业：精密陶瓷材料，烧结陶瓷原料，***高温涂料等

包装：10公斤/塑料袋，20公斤/箱